The photolithography process is complete. After checking the results under the microscope it was discovered that the resist had been removed in areas that were not supposed to be removed. This was the same for all three samples. Therefore it was assumed that the mask that was used was dirty. One of the samples also had black square markingings. After consulting with my supervisor it was determined that the black marks were from a defect in the crystal structure of the silicon wafer. Even though the samples aren’t perfect, they are still good to use in the etching process.