Lab facilities

OSU Nanotech West

We use this facility for fabrication and a few characterizations like Electron Beam Lithography; Optical Lithography – Maskless aligner and contact aligner; Deposition tools – Sputter, E-beam Evaporators, ALD; Plasma Ashing; RTA; ICP-RIE; High-Resolution XRD; AFM.

MBE Facility

We use this facility to grow GaN, AlGaN, and Ga2O3 epitaxial layers and 3D Ga2O3 etching.


This sophisticated facility gives us access to high-resolution TEM, SEM, XRD, and FIBs.